Silicon Nanophotonics Fabrication Course - 2010

Canada-wide Silicon Nanophotonics, 2010

In partnership with CMC Microsystems, the University of British Columbia is providing an opportunity for training in the design, fabrication and test of photonic integrated circuits (PICs) targeting IMEC's silicon-on-insulator (SOI) technology. This training can be integrated with your research or as a stand-alone learning opportunity. Target applications include Optical Communications and Sensors.

Technology Description:

• Silicon-on-insulator, 220nm top Si film, 2000nm buried oxide (BOX)
• 193nm deep UV lithography, enabling features down to ~120 nm
• Supports design and fabrication of a range of PICs including:
  • photonic crystals
  • waveguides (photonic crystal or ridge)
  • gratings for fiber coupling
  • multiplexers (diffraction or arrayed waveguide)
  • ring resonators
  • filters
• Target applications include optical communications, sensors, and biomedical devices

Two training options are available:

Option 1	Option 2
6-credit graduate course with 3 weeks of instruction	One-week workshop
July 5-24, 2010	July 19-24, 2010
UBC	UBC
$600 fabrication fee	·  $4000 (tuition and fabrication fee) ·  Note: Preferred pricing of $1100 for CMC’s Prototyping level subscribers and their students (see Eligibility and Special Notes)
Course Registration for UBC EECE 584 (see Special Notes)	·  No limitation at $4000 level ·  Must be Canadian academic to benefit from preferred pricing.
·    Visiting students from institutions noted in the special note below) may register for UBC EECE 584 at no cost.   ·    Visiting students are eligible for Financial Assistance towards travel and accommodation costs if their supervisor holds a Designer or Prototyping level subscription with CMC. To obtain a Prototyping level subscription see: http://www.cmc.ca/CMCSubscription/	· Prototyping subscribers are also eligible to apply for Financial Assistance towards travel and accommodation costs. · To obtain a Prototyping level subscription see: http://www.cmc.ca/CMCSubscription/

Training Schedule:

• Instruction on-site at UBC- July, 2010
• Self-paced design and modeling – July to October, 2010
  • Access to software tools, on-line tutorials, on-line discussion forums and design feedback provided
• Design submission (mask deadline date) – November, 2010
• Device testing and model validation – April-June, 2011
  • Testing resources available from UBC or CMC, if required

Course details

Option 1	Option 2
Prerequisites: Enrolled in a graduate degree program at a Canadian university Laptop for on-site training (computer rental may be arranged)	Prerequisites: Course(s) at the senior undergraduate or graduate level on optics, waveguides, lasers, etc. (background material will be provided ahead of time) Laptop for on-site training (computer rental may be arranged)
Instruction syllabus summary: Theory of optical wave propagation, waveguides, couplers, resonators Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab, Lumerical FDTD, RSoft BeamProp Mask design and layout using DW2000 Design considerations for IMEC SOI process	Workshop syllabus summary: Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab, Lumerical FDTD, RSoft BeamProp Mask design and layout using DW2000 Design considerations for IMEC SOI process
EECE 584 evaluation: 50%: Design (design description, modeling, layout) 30%: Testing (experimental setup, measurements, comparison with model) 20%: Final report (3-8 page two-column IEEE journal style report, or manuscript for publication) and presentation (10 minutes)	CMC workshop certification upon successful completion of a design and test report.

Accommodation:

Accommodations (single and twin rooms) have been reserved and are available on a first-come-first-served basis (availability is limited):

• Location: UBC "Totem Park" student residence
• Rate: $35 per night, plus tax and including breakfast
• Booking Date: Requests must be received by June 27, 2010 at the latest Please advise the Registrar if you wish to reserve a room.

Training Costs Include:

• Instruction, use of Design Tools, device fabrication, use of Test Equipment, support (including discussion forum access), lunch and refreshment breaks during week long on-site session

Special Note:

Visiting students from the following universities have their tuition fees waived:

• Under the Western Dean’s Agreement: Alberta, Athabasca, Brandon, British Columbia, British Columbia Institute of Technology, Calgary, Concordia University, College of Alberta, Lethbridge, Manitoba, Northern British Columbia, Regina, Royal Roads University, Saskatchewan, Simon Fraser, and Victoria
• Under the Graduate Exchange Agreement: McGill University, University of Toronto, Université de Montréal
• Information about these agreements is at the following UBC link.

Instructors and contact information:

• Dr. Lukas Chrostowski
• Dr. Nicolas A. F. Jaeger
• Dr. Dan Deptuck, CMC
• Online discussion forum
• Contact Heather Walker, for CMC registration, registrar@cmc.ca

For further information, please contact Lukas Chrostowski by email lukasc@ece.ubc.ca

Fabrication Technology Details

• Fabrication Technology details: ePIXfab IMEC3, Technology, passive cSOI 220nm
• Total space for all designs is a 12.5mm x 8.6mm cell (or multiple cells depending on demand), individual designs will range from 1 mm x 0.1 mm to 6mm x 2-3 mm
• Software tools available, provided by CMC:
  • Design Workshop dw-2000 (layout and verification tool)
  • RSoft: BeamPROP (BPM tool), FemSIM (finite element mode solver), and MOST (design optimization tool)
  • Optiwave: OptiBPM (BPM tool)
  • Lumerical FDTD
  • See https://www1.cmc.ca/clients/design/optoelectronics.php for further details on these tools and how to access them. Students will have to register with CMC to get access.
  • Other tools available locally can also be used.

Successful outcomes from 2008, 2009 courses:

• Publications about this course, and student publications:

Additional readings:

• W. Bogaerts, P. Dumon, D. Van Thourhout, R. Baets, "Low-Loss, Low-Crosstalk Crossings for SOI Nanophotonic Waveguides", 10/2007, Optics Letters, 32(19), p.2801-2803
• W. Bogaerts, P. Dumon, D. Van Thourhout, D. Taillaert, P. Jaenen, J. Wouters, S. Beckx, R. Baets, "Compact Wavelength-Selective Functions in Silicon-on-Insulator Photonic Wires", 12/2006, J. Selected Topics in Quantum Electronics, 12(6) p.1394-1401
• J. Brouckaert, W. Bogaerts, S. Selvaraja, P. Dumon, R. Baets, D. Van Thourhout, "Planar Concave Grating Demultiplexer with High Reflective Bragg Reflector Facets", 2/2008, Photonics Technology Letters, 20(4) p.309-311
• W. Bogaerts, D. Taillaert, P. Dumon, D. Van Thourhout, R. Baets, "A polarization-diversity wavelength duplexer circuit in silicon-on-insulator photonic wires", 2/2007, Optics Express, 15(4) p.1567-1578
• G. Roelkens, D. Vermeulen, D. Van Thourhout, R. Baets, S. Brision, P. Lyan, P. Gautier, J.-M. Fedeli, "High efficiency diffractive grating couplers for interfacing a single mode optical fiber with a nanophotonic silicon-on-insulator waveguide circuit" , 4/2008, Applied Physics Letters, 92(13) p.131101
• F. Van Laere, T. Claes, J. Schrauwen, S. Scheerlinck, W. Bogaerts, D. Taillaert, L. O'Faolain, D. Van Thourhout, R. Baets, "Compact Focusing Grating Couplers for Silicon-on-Insulator Integrated Circuits", 12/2007, Photonics Technology Letters, 19(23) p.1919-1921
• W. Bogaerts, R. Baets, P. Dumon, V. Wiaux, S. Beckx, D. Taillaert, B. Luyssaert, J. Van Campenhout, P. Bienstman, D. Van Thourhout, "Nanophotonic Waveguides in Silicon-on-Insulator Fabricated with CMOS Technology", 1/2005, Journal of Lightwave Technology (invited), 23(1) p.401-412